|
![](01/top01.gif) |
![](01/top01-.gif) |
![](01/1995.gif) |
05. ÇüÁ¦ Áø°ø ¼³¸³ |
|
11. UO2 Plasma Etcher
System °³¹ß (MODEL : UPES-01) |
![](01/1996.gif) |
05. '96 »ê, ÇÐ, ¿¬ °øµ¿
±â¼ú°³¹ß Âü¿© ¼öÇà |
|
06. R.T.A System
°³¹ß |
|
11. PE CVD °³¹ß |
|
12. '96 »ê, ÇÐ, ¿¬ °øµ¿±â¼ú
°³¹ß¿Ï·á [°úÁ¦¸í : MO(GaN)CVD Àåºñ] |
![](01/1997.gif) |
02. ¢ßÇüÁ¦Áø°øÀ¸·Î »óÈ£ º¯°æ
¹× ¹ýÀÎ ¼³¸³ |
|
12. '97 ¿ì¼ö Áß¼Ò±â¾÷ ´ë»ó
¼±Á¤(°í¾ç½Ã) |
![](01/1998.gif) |
05. Çü½Ä½ÂÀÎ ¹øÈ£ Ãëµæ(heat
pipe heater) |
|
10. heat Pipe Heater
°³¹ß ¹× »óÇ°È |
|
11. 'Q' ¸¶Å© Ãëµæ(heat
pipe heater) |
|
11. º´¿ªÆ¯·Ê¾÷ü ÁöÁ¤ |
|
12. °æ±âµµ ÆÄÁֽ÷ΠÀÚ»ç ÀÌÀü |
|
12. CLEAN ROOM(CLASS
100) ÁØ°ø (°æ±âµµ ÆÄÁÖ) |
![](01/1999.gif) |
02. ¢ßÇüÁ¦Áø°ø¿¡¼ ¢ß¼¿ïº£Å¨Å×Å©·Î
»óÈ£ º¯°æ |
|
05. °ø¾÷±â¹Ý±â¼ú°³¹ß»ç¾÷ ¼±Á¤(»êÀÚºÎ)
[°úÁ¦¸í : Wafer lever Áø°ø Packing] |
![](01/2000.gif) |
04. °ø¾÷ ±â¹Ý ±â¼ú °³¹ß »ç¾÷
1Â÷³âµµ ¿Ï·á
|
°úÁ¦¸í : Wafer lever Áø°ø Packaging °øÁ¤/TOOL ±â¼ú
°³¹ß |
|
|
SOI(silicon on insulater) WAFER ¾ç»ê °èȹ ¼ö¸³ |
|
05. °ø¾÷±â¹Ý ±â¼ú °³¹ß»ç¾÷(»ê¾÷ÀÚ¿øºÎ) 2Â÷³âµµ ½ÃÀÛ |
|
°úÁ¦¹° : Wafer lever Áø°ø Packaging °øÁ¤/TOOL ±â¼ú °³¹ß |
![](01/2002.gif) |
¹ß¸íƯÇãµî·Ï (ƯÇã Á¦0359029) |
|
¹ß¸í¸íĪ : À§ÆÛ Á¢ÇÕÀåÄ¡ÀÇ ½ºÆäÀ̼ À̵¿¿ë ½½¶óÀ̵å ÀåÄ¡ |
|
07. Cold Cathede Full Automatic Pumping&Bombarding System °³¹ß |
|
07. 2002 ºÎ»ê»çÀÎ µðÀÚÀÎÀü(Bexco) Cold Cathede Pumping System ÃâÇ° |
|
12. CCFL °³¹ß ÆÀ ½Å¼³ |
|
±¹¹ÎÀºÇà(KB *b), KT&G µî Lamp Á¦ÀÛ ³³Ç° |
![](01/2003.gif) |
08. »ï¼ºÈÀç ¿ÜºÎ Sign Àû¿ë Cold Cathode Lamp Àü±¹ ¹°·® ³³Ç°
|
|
11. ÀÚü °³¹ß Cold Cathode ¿ë ÀüÀÚ½Ä Transformer °³¹ß
|
|
|
Kosign 2003 Çѱ¹ »çÀΕµðÀÚÀÎÀü Âü°¡ |
12. ¸ñµ¿ SBS ½ÅÃà »ç¿Á ¿ÜºÎ Sign Cold Cathode Lamp ³³Ç°
|
![](01/2004.gif) |
02. Vacuum Dry Oven °³¹ß |
|
11. TiO2 Coating CVD System °³¹ß |
![](01/2005.gif) |
08. Hot Plate °³¹ß(1000*1500) |
![](01/2006.gif) |
05. HP/CP Glass Loading System °³¹ß |
![](01/2007.gif) |
11. Hot Plate 1Â÷ ÇöÀå Áõ¼³ (ÄÚ¸ä³×Æ®¿öÅ©) |
![](01/2008.gif) |
04. Hot Plate ´ë¸¸¼öÃâ |
|
06. ÀÚü ¾ç»ê¿ë TiO2 CVD System °³¹ß |
|
08. CVD System ³³Ç° (ÈÇבּ¸¼Ò) |
![](01/2009.gif) |
07. Äݵå¹è±â½Ã½ºÅÛ 1Â÷ Áß±¹¼öÃâ |
|
11. Äݵå¹è±â½Ã½ºÅÛ 2Â÷ Áß±¹¼öÃâ |
|
12. Hot Plate 2Â÷ ÇöÀå Áõ¼³ (ÄÚ¸ä³×Æ®¿öÅ©) |
![](01/2010.gif) |
05. Hot Plate 1Â÷ ÇöÀå Áõ¼³ (Çѱ¹¾Ë¹Ú¸ÓÅ͸®¾óÁî) |
|
06. R.T.B System ¸»·¹ÀÌ½Ã¾Æ ¼öÃâ |
|
11. R.T.B System µ¶ÀÏ ¼öÃâ |
![](01/2011.gif) |
01. Hot Plate 2Â÷ ÇöÀå Áõ¼³ (Çѱ¹¾Ë¹Ú¸ÓÅ͸®¾óÁî) |
|
02. Hot Plate 3Â÷ ÇöÀå Áõ¼³ (Çѱ¹¾Ë¹Ú¸ÓÅ͸®¾óÁî) |
|
08. R.T.B System Áß±¹, ÀϺ» ¼öÃâ |
|
11. Á¦ÀÌ¿¡½º¾ØÈÄÁöºñ¾¾¿Í ´ÙÀ̾Ƹóµå ÄÚÆÿë PACVD System ÇÕÀÛ°³¹ß |
![](01/2012.gif) |
04. R.T.B System ´ë¸¸, ű¹ ¼öÃâ |
|
10. Vacuum Dry Oven ¾÷±×·¹ÀÌµå °³¹ß |
![](01/2013.gif) |
05. R.T.B System ÀϺ» ¼öÃâ |
|
|