05. ÇüÁ¦ Áø°ø ¼³¸³
  11. UO2 Plasma Etcher System °³¹ß (MODEL : UPES-01)

05. '96 »ê, ÇÐ, ¿¬ °øµ¿ ±â¼ú°³¹ß Âü¿© ¼öÇà
  06. R.T.A System °³¹ß
  11. PE CVD °³¹ß
  12. '96 »ê, ÇÐ, ¿¬ °øµ¿±â¼ú °³¹ß¿Ï·á [°úÁ¦¸í : MO(GaN)CVD Àåºñ]

02. ¢ßÇüÁ¦Áø°øÀ¸·Î »óÈ£ º¯°æ ¹× ¹ýÀÎ ¼³¸³
  12. '97 ¿ì¼ö Áß¼Ò±â¾÷ ´ë»ó ¼±Á¤(°í¾ç½Ã)

05. Çü½Ä½ÂÀÎ ¹øÈ£ Ãëµæ(heat pipe heater)
  10. heat Pipe Heater °³¹ß ¹× »óÇ°È­
  11. 'Q' ¸¶Å© Ãëµæ(heat pipe heater)
  11. º´¿ªÆ¯·Ê¾÷ü ÁöÁ¤
  12. °æ±âµµ ÆÄÁֽ÷ΠÀÚ»ç ÀÌÀü
  12. CLEAN ROOM(CLASS 100) ÁØ°ø (°æ±âµµ ÆÄÁÖ)

02. ¢ßÇüÁ¦Áø°ø¿¡¼­ ¢ß¼­¿ïº£Å¨Å×Å©·Î »óÈ£ º¯°æ
  05. °ø¾÷±â¹Ý±â¼ú°³¹ß»ç¾÷ ¼±Á¤(»êÀÚºÎ) [°úÁ¦¸í : Wafer lever Áø°ø Packing]

04. °ø¾÷ ±â¹Ý ±â¼ú °³¹ß »ç¾÷ 1Â÷³âµµ ¿Ï·á
  °úÁ¦¸í : Wafer lever Áø°ø Packaging °øÁ¤/TOOL ±â¼ú °³¹ß
     SOI(silicon on insulater) WAFER ¾ç»ê °èȹ ¼ö¸³
  05. °ø¾÷±â¹Ý ±â¼ú °³¹ß»ç¾÷(»ê¾÷ÀÚ¿øºÎ) 2Â÷³âµµ ½ÃÀÛ
     °úÁ¦¹° : Wafer lever Áø°ø Packaging °øÁ¤/TOOL ±â¼ú °³¹ß

¹ß¸íƯÇãµî·Ï (ƯÇã Á¦0359029)
  ¹ß¸í¸íĪ : À§ÆÛ Á¢ÇÕÀåÄ¡ÀÇ ½ºÆäÀ̼­ À̵¿¿ë ½½¶óÀ̵å ÀåÄ¡
  07. Cold Cathede Full Automatic Pumping&Bombarding System °³¹ß
  07. 2002 ºÎ»ê»çÀÎ µðÀÚÀÎÀü(Bexco) Cold Cathede Pumping System ÃâÇ°
  12. CCFL °³¹ß ÆÀ ½Å¼³
     ±¹¹ÎÀºÇà(KB *b), KT&G µî Lamp Á¦ÀÛ ³³Ç°

08. »ï¼ºÈ­Àç ¿ÜºÎ Sign Àû¿ë Cold Cathode Lamp Àü±¹ ¹°·® ³³Ç°

 

11. ÀÚü °³¹ß Cold Cathode ¿ë ÀüÀÚ½Ä Transformer °³¹ß

    Kosign 2003 Çѱ¹ »çÀΕµðÀÚÀÎÀü Âü°¡

12. ¸ñµ¿ SBS ½ÅÃà »ç¿Á ¿ÜºÎ Sign Cold Cathode Lamp ³³Ç°


02. Vacuum Dry Oven °³¹ß

  11. TiO2 Coating CVD System °³¹ß

08. Hot Plate °³¹ß(1000*1500)


05. HP/CP Glass Loading System °³¹ß


11. Hot Plate 1Â÷ ÇöÀå Áõ¼³ (ÄÚ¸ä³×Æ®¿öÅ©)


04. Hot Plate ´ë¸¸¼öÃâ

  06. ÀÚü ¾ç»ê¿ë TiO2 CVD System °³¹ß
  08. CVD System ³³Ç° (È­Çבּ¸¼Ò)

07. Äݵå¹è±â½Ã½ºÅÛ 1Â÷ Áß±¹¼öÃâ

  11. Äݵå¹è±â½Ã½ºÅÛ 2Â÷ Áß±¹¼öÃâ
  12. Hot Plate 2Â÷ ÇöÀå Áõ¼³ (ÄÚ¸ä³×Æ®¿öÅ©)

05. Hot Plate 1Â÷ ÇöÀå Áõ¼³ (Çѱ¹¾Ë¹Ú¸ÓÅ͸®¾óÁî)

  06. R.T.B System ¸»·¹ÀÌ½Ã¾Æ ¼öÃâ
  11. R.T.B System µ¶ÀÏ ¼öÃâ

01. Hot Plate 2Â÷ ÇöÀå Áõ¼³ (Çѱ¹¾Ë¹Ú¸ÓÅ͸®¾óÁî)

  02. Hot Plate 3Â÷ ÇöÀå Áõ¼³ (Çѱ¹¾Ë¹Ú¸ÓÅ͸®¾óÁî)
  08. R.T.B System Áß±¹, ÀϺ» ¼öÃâ
  11. Á¦ÀÌ¿¡½º¾ØÈÄÁöºñ¾¾¿Í ´ÙÀ̾Ƹóµå ÄÚÆÿë PACVD System ÇÕÀÛ°³¹ß

04. R.T.B System ´ë¸¸, ű¹ ¼öÃâ

  10. Vacuum Dry Oven ¾÷±×·¹ÀÌµå °³¹ß

05. R.T.B System ÀϺ» ¼öÃâ